Recent Advances in PMOS Negative Bias Temperature Instability: Characterization and Modeling of Device Architecture, Material and Process Impact
This book examines recent advances in PMOS negative bias temperature instability, covering characterization and modeling of device architecture, material, and process impacts.
About This Book
This book presents recent advances in PMOS negative bias temperature instability.
It focuses on characterization and modeling of device architecture, material, and process impact.
The content covers key aspects relevant to semiconductor device reliability and performance.
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