Principles of Chemical Vapor Deposition
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Principles of Chemical Vapor Deposition

by D.M. Dobkin, M.K. Zuraw

Materials Science Chemical Engineering Semiconductor Technology
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Principles of Chemical Vapor Deposition offers a focused treatment of the concepts behind chemical vapor deposition. Drawing on chemistry, engineering, and materials science, this specialized book provides a structured resource for readers studying or working with this important technical subject.

About This Book

Principles of Chemical Vapor Deposition examines the foundational concepts associated with chemical vapor deposition.

The book presents the subject within the broader context of chemistry, engineering, and materials science.

It is intended for readers seeking a structured resource on the principles behind this technical field.

Written by D.M. Dobkin and M.K. Zuraw, the book offers a specialized treatment of its stated subject.

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I will be using this book for: