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等离子体蚀刻及其在大规模集成电路制造中的应用 9787302489597 张海洋等清华大学出版社

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Engineering technical manual Semiconductor Technology

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A technical reference exploring plasma etching techniques and their applications in large-scale integrated circuit manufacturing for engineers and researchers.

ISBN-13 9787302489597 ASIN 7302489599 Views 94 Publisher Press Year 2019 Format Paperback Product Group Book Adult No Created March 10, 2026 Updated September 16, 2026

About This Book

This book examines plasma etching processes used in semiconductor fabrication.

It covers fundamental principles and practical applications in integrated circuit production.

The text is intended for engineers and researchers working in microelectronics manufacturing.

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I will be using this book for:

等离子体蚀刻及其在大规模集成电路制造中的应用 9787302489597 张海洋 等 清华大学出版社

About This Book

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